Maskless Photolithography System
Make: Heidelberg·Model: MLA 150·Year installed: 2024
About this instrument
Maskless Photolithography System (Heidelberg MLA 150) hosted at the central instrumentation facility of Tata Institute of Fundamental Research, Mumbai. Typical applications include microfabrication, MEMS device patterning, photomask writing, wafer-scale patterning. Available to academia and industry through I-STEM with trained operator support.
Typical applications
- microfabrication
- MEMS device patterning
- photomask writing
- wafer-scale patterning
- cleanroom prototyping
Specifications
- Resolution
- 0.6 µm
- Write area
- 150 × 150 mm
- Alignment
- ± 250 nm backside
Tariff
| Academic / Industry | per hour |
|---|---|
| Academic | ₹1,500 |
| Industry | ₹7,500 |
Similar equipment nearby
Alternatives with the same technique or in the same discipline.
Maskless Photolithography System
Bhabha Atomic Research Centre
Mumbai, Maharashtra
Academic
₹2,800 /hour
Maskless Photolithography System
Bhabha Atomic Research Centre
Mumbai, Maharashtra
Academic
₹2,850 /hour
Maskless Photolithography System
IISER Pune
Pune, Maharashtra
Academic
₹2,800 /hour
Maskless Photolithography System
IIT Indore
Indore, Madhya Pradesh
Academic
₹1,750 /hour
Maskless Photolithography System
IISER Bhopal
Bhopal, Madhya Pradesh
Academic
₹1,500 /hour
Maskless Photolithography System
IISER Bhopal
Bhopal, Madhya Pradesh
Academic
₹2,450 /hour