Maskless Photolithography System
Make: Heidelberg·Model: MLA 150·Year installed: 2015
About this instrument
Maskless Photolithography System (Heidelberg MLA 150) hosted at the central instrumentation facility of AIIMS New Delhi, New Delhi. Typical applications include microfabrication, MEMS device patterning, photomask writing, wafer-scale patterning. Available to academia and industry through I-STEM with trained operator support.
Typical applications
- microfabrication
- MEMS device patterning
- photomask writing
- wafer-scale patterning
- cleanroom prototyping
Specifications
- Resolution
- 0.6 µm
- Write area
- 150 × 150 mm
- Alignment
- ± 250 nm backside
Tariff
| Academic / Industry | per hour |
|---|---|
| Academic | ₹2,600 |
| Industry | ₹7,800 |
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