Maskless Photolithography System
Make: Heidelberg·Model: MLA 150·Year installed: 2020
About this instrument
Maskless Photolithography System (Heidelberg MLA 150) hosted at the central instrumentation facility of IIT Bhubaneswar, Bhubaneswar. Typical applications include microfabrication, MEMS device patterning, photomask writing, wafer-scale patterning. Available to academia and industry through I-STEM with trained operator support.
Typical applications
- microfabrication
- MEMS device patterning
- photomask writing
- wafer-scale patterning
- cleanroom prototyping
Specifications
- Resolution
- 0.6 µm
- Write area
- 150 × 150 mm
- Alignment
- ± 250 nm backside
Tariff
| Academic / Industry | per hour |
|---|---|
| Academic | ₹3,150 |
| Industry | ₹9,450 |
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